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tengely Hazafias Pálinka nickel oxide wet etching Egyetemi Út ház asztal

Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes: Journal of Vacuum Science & Technology A: Vol 38, No 5
Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes: Journal of Vacuum Science & Technology A: Vol 38, No 5

Surface SEM micrographs from the nickel side of LSCO/YSZ/Ni cells after... | Download Scientific Diagram
Surface SEM micrographs from the nickel side of LSCO/YSZ/Ni cells after... | Download Scientific Diagram

PDF] Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching | Semantic Scholar
PDF] Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching | Semantic Scholar

Materials | Free Full-Text | Surface Modification of Additively Manufactured Nitinol by Wet Chemical Etching
Materials | Free Full-Text | Surface Modification of Additively Manufactured Nitinol by Wet Chemical Etching

Selective Wet and Dry Etching of NiO over β-Ga2O3 - IOPscience
Selective Wet and Dry Etching of NiO over β-Ga2O3 - IOPscience

Wet-chemical Etching of Aluminium, Gold, Chromium, Copper, Silver, Nickel, Titanium
Wet-chemical Etching of Aluminium, Gold, Chromium, Copper, Silver, Nickel, Titanium

Nickel oxide hi-res stock photography and images - Alamy
Nickel oxide hi-res stock photography and images - Alamy

Chemical Etching of GaN in KOH Solution: Role of Surface Polarity and Prior Photoetching | The Journal of Physical Chemistry C
Chemical Etching of GaN in KOH Solution: Role of Surface Polarity and Prior Photoetching | The Journal of Physical Chemistry C

Thermal Atomic Layer Etching of Nickel Using Sequential Chlorination and Ligand-Addition Reactions
Thermal Atomic Layer Etching of Nickel Using Sequential Chlorination and Ligand-Addition Reactions

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching
Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Evidences for redox reaction driven charge transfer and mass transport in metal-assisted chemical etching of silicon | Scientific Reports
Evidences for redox reaction driven charge transfer and mass transport in metal-assisted chemical etching of silicon | Scientific Reports

Anisotropic diamond etching through thermochemical reaction between Ni and diamond in high-temperature water vapour | Scientific Reports
Anisotropic diamond etching through thermochemical reaction between Ni and diamond in high-temperature water vapour | Scientific Reports

Anisotropic diamond etching through thermochemical reaction between Ni and diamond in high-temperature water vapour | Scientific Reports
Anisotropic diamond etching through thermochemical reaction between Ni and diamond in high-temperature water vapour | Scientific Reports

Removal of metal oxide defects through improved semi-anisotropic wet etching process
Removal of metal oxide defects through improved semi-anisotropic wet etching process

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching
Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching

Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants | Chemistry of Materials
Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants | Chemistry of Materials

Formation of U-shaped diamond trenches with vertical {111} sidewalls by anisotropic etching of diamond (110) surfaces - ScienceDirect
Formation of U-shaped diamond trenches with vertical {111} sidewalls by anisotropic etching of diamond (110) surfaces - ScienceDirect

Materials | Free Full-Text | Fabrication of Hydrophobic Ni Surface by Chemical Etching
Materials | Free Full-Text | Fabrication of Hydrophobic Ni Surface by Chemical Etching

Single-Orientation Nanoporous NiO Films: Spontaneous Evolution from Dense Low-Crystalline Ni(OH)x Films | Crystal Growth & Design
Single-Orientation Nanoporous NiO Films: Spontaneous Evolution from Dense Low-Crystalline Ni(OH)x Films | Crystal Growth & Design

Materials | Free Full-Text | Fabrication of Hydrophobic Ni Surface by Chemical Etching
Materials | Free Full-Text | Fabrication of Hydrophobic Ni Surface by Chemical Etching

TEM image of nickel silicide after partial TEOS etching and oxide wet... | Download Scientific Diagram
TEM image of nickel silicide after partial TEOS etching and oxide wet... | Download Scientific Diagram

SEM images of nickel oxide nanodots a before and b after wet etching.... | Download Scientific Diagram
SEM images of nickel oxide nanodots a before and b after wet etching.... | Download Scientific Diagram

Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing: Journal of Vacuum Science & Technology A: Vol 38, No 4
Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing: Journal of Vacuum Science & Technology A: Vol 38, No 4

Selective Wet and Dry Etching of NiO over β-Ga2O3 - IOPscience
Selective Wet and Dry Etching of NiO over β-Ga2O3 - IOPscience